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用射频溅射法制备了Fe71.5Cu1Cr2.5V4Si12B9单层膜和结构为(F/S)3/M/(F/S)3的多层膜,在制备过程中加72kA/m的纵向磁场.研究表明在制备过程中加磁场明显改善了材料的软磁性能,降低了材料的矫顽力.将样品经不同温度退火热处理后,发现经230℃退火1.5h的单层膜和多层膜具有最佳的软磁性能和最大的磁阻抗效应,单层膜最大横向磁阻抗比为37.5%,多层膜最大横向磁阻抗比高达277%.通过比较单层和多层膜磁阻抗效应随频率和磁场的变化,发现多层膜具有较低的磁阻抗效应的临界频率和峰值特征频率,和较大的磁阻抗变化率,而且有较低的横向磁阻抗效应的饱和场.
The Fe71.5Cu1Cr2.5V4Si12B9 monolayer and (F / S) 3 / M / (F / S) 3 multilayers were prepared by radio frequency sputtering, and a longitudinal magnetic field of 72kA / m was added during the preparation. The results show that the magnetic field increases the soft magnetic properties of the material and the coercivity of the material obviously.After annealed at different temperatures, the monolayers and multilayer films annealed at 230 ℃ for 1.5h have The best soft magnetic properties and the maximum magneto-impedance effect of single-layer film maximum transverse magnetic resistance ratio of 37.5%, maximum transverse magnetic multilayer resistance ratio as high as 277% by comparing the single-layer and multilayer magnetic impedance effect with frequency It is found that the multilayer films have lower critical frequency and peak characteristic frequency of magneto-impedance effect, larger magnetic impedance change rate and lower saturation field of transverse magneto-impedance effect.