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传统的磁控溅射设备由于等离子体在靶面形成跑道效应,所以存在着靶材利用率低,反应溅射过程中稳定性差的问题。M.J.Thwaites提出了一种利用磁场将等离子体产生与溅射分开的结构,本文基于这种结构构造了一个实验平台对其进行了研究,实现了全靶腐蚀,提高了系统的稳定性。
The traditional magnetron sputtering equipment has the problem of low efficiency of target utilization and poor stability during reactive sputtering because the plasma forms a runway effect on the target surface. M.J. Thwaites proposed a structure that uses a magnetic field to separate the plasma from the sputter. In this paper, an experimental platform was constructed based on this structure to study it, to achieve full target corrosion and to improve the stability of the system.