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The collisional quenching rate constants of CH(A, V’=0) by Ar and CHBr3 and CH(A, B, V’= 0) by NO molecule were measured by means of laser photolysis of CHBr3 molecule at 266 nm generating CH(A, B) radicals and monitoring the time-resolved signal of ethession CH(A, B→X). The dependence of quenching rate constant of CH(A, V’=0) by CHBr3 on rotational state of CH(A) is presented. It is found that the quenching rate decreases with increasing rotational quantum number of CH(A).
The collisional quenching rate constants of CH (A, V ’= 0) by Ar and CHBr3 and CH (A, B, V’ = 0) by NO molecule were measured by means of laser photolysis of CHBr3 molecule at 266 nm generating CH A, B) radicals and monitoring the time-resolved signal of ethession CH (A, B → X). The dependence of quenching rate constant of CH (A, V ’= 0) by CHBr3 on rotational state of CH It is found that the quenching rate decreases with increasing rotational quantum number of CH (A).