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利用超声表面波在分层结构中传播的频散特性来测量薄膜的机械特性具有准确、快速、对材料无损伤等突出优点.本文研究了在Si(100)衬底上淀积双层薄膜的分层结构中超声表面波沿Si[110]晶向传播的速度-频率色散关系.应用此方法对超大规模集成电路(ULSI)中具有质软、易碎特点的低介电常数互连介质(low-k)薄膜的机械特性进行了表面波频散计算.研究了先进ULSI互连布线系统中广泛存在的3种分层薄膜结构上表面波的频散特性.计算表明不同分层结构对表面波的频散特性影响很大.对于同一分层结构,表面波的频散曲率随low-k薄膜杨氏模量的减小而显著增大.本工作为准确测定low-k薄膜的杨氏模量提供了理论计算依据.
The advantage of ultrasonic wave propagating in layered structure to measure the mechanical properties of thin films is accurate, rapid and non-destructive to the material.This paper studies the deposition of double-layer thin films on Si (100) substrates The velocity-frequency dispersion relation of ultrasonic surface wave propagating along Si [110] crystal in layered structure is studied.Using this method, the low dielectric constant interconnection medium with ultra-large scale integrated circuit (ULSI) low-k) thin films were calculated. The dispersion characteristics of the three kinds of layered surface films widely distributed in the ULSI interconnection wiring system were studied. The calculated results show that the different surface roughness For the same layered structure, the dispersion curvature of the surface wave significantly increases with the Young’s modulus of the low-k thin film.This work is to accurately measure the Young’s Modulus provides the basis for theoretical calculations.