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采用射频磁控溅射法在抛光的CVD金刚石膜上制备了立方(222)择优取向的Y2O3薄膜,利用XRD,纳米力学探针,划痕仪,FTIR和TEM等手段研究了退火对Y2O3薄膜的结构、力学性能和红外透过率的影响及Y2O3的微观结构。结果表明:通过退火Y2O3薄膜的结晶程度增加,退火后的择优取向仍为立方相(222)晶面结构;薄膜的硬度降低而弹性模量升高,薄膜与金刚石的结合力增加;薄膜的红外透过率略有降低;薄膜为柱状晶结构并存在大量非晶态。
The cubic (222) preferred orientation Y2O3 thin films were prepared on the polished CVD diamond films by RF magnetron sputtering. The effects of annealing on the Y2O3 thin films were investigated by means of XRD, nano mechanical probe, scratch tester, FTIR and TEM. Structure, Mechanical Properties and Infrared Transmittance and the Microstructure of Y2O3. The results show that the preferred orientation after annealing is still the cubic phase (222) crystal structure with the increase of the crystallinity of the annealed Y2O3 film. The hardness of the film decreases and the elastic modulus increases, and the binding force between the film and the diamond increases. The transmittance decreased slightly; the film was columnar crystal structure with a large amount of amorphous state.