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报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术。用这种技术制作可动微机械，动件和固定件同时制作。要求的掩模数减到最少。同现有的牺牲层材料相比，光致抗蚀剂作牺牲层材料具有一些优越性。首先，光致抗蚀剂能直接涂敷，能直接光刻成形。此外，用光致抗蚀剂作牺牲层材料不影响结构的厚度和材料的选择。工艺优化后，结构洁净度、固定件与基片的结合强度及牺牲层去除速度都得到了改善。
A new technique of fabricating movable micromechanical structures using photoresist as sacrificial layer material is reported. Using this technology to make mobile micro-machinery, moving parts and fasteners at the same time. Minimize the number of masks required. Photoresists have some advantages over sacrificial layer materials as compared to existing sacrificial layer materials. First, the photoresist can be directly coated, can be directly lithography. In addition, the use of a photoresist as a sacrificial layer material does not affect the thickness of the structure and the choice of material. After process optimization, the cleanliness of the structure, the bond strength of the fixture to the substrate, and the sacrificial layer removal rate are all improved.