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A double silicon on insulator(DSOI) structure was introduced based on fully depleted SOI(FDSOI)technology.The circuit performance could be adjusted dynamically through the separate back gate electrodes applied to N-channel and P-channel devices.Based on DSOI ring oscillator(OSC),this paper focused on the theoretical analysis and electrical test of how the OSC’s frequency being influenced by the back gate electrodes(soi2n,soi2p).The testing results showed that the frequency and power consumption of OSC could change nearly linearly along with the back gate bias.According to the different requirements of the circuit designers,the circuit performance could be improved by positive soi2 n and negative soi2 p,and the power consumption could be reduced by negative soi2n and positive soi2p.The best compromise between performance and power consumption of the circuit could be achieved by appropriate back gate biasing.
A double silicon on insulator (DSOI) structure was introduced based on fully depleted SOI (FDSOI) technology. The circuit performance could be adjusted dynamically through the separate back gate electrodes applied to N-channel and P-channel devices. Based on DSOI ring oscillator (OSC), this paper focused on the theoretical analysis and electrical test of how the OSC’s frequency being influenced by the back gate electrodes (soi2n, soi2p). Testing results showed that frequency and power consumption of OSC could change nearly linearly along with with the back gate bias. According to the different requirements of the circuit designers, the circuit performance could be improved by positive soi2 n and negative soi2 p, and the power consumption could be reduced by negative soi2n and positive soi2p. best compromise between performance and power consumption of the circuit could be achieved by appropriate back gate biasing.