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根据激光敌我识别系统的使用要求,选择H4和SiO2作为高低折射率材料,借助Macleod和TFCalc软件进行膜系优化设计和分析。采用电子束真空镀膜的方法并加以离子辅助沉积技术,通过正交矩阵实验对材料的工艺参数进行调整和优化,利用基片的正反面分别对带通滤光片的长波反射带和短波反射带进行展宽,解决了单面膜层过厚难以控制的问题,制备了符合要求的激光滤光膜。镀膜后的基片在532,632,905,1064和1550nm波长处的透射率小于0.2%,808nm波长附近的平均透射率大于95%。并在532nm和1064nm波长处具有较高的激光损伤阈值,能承受恶劣的环境测试,满足激光敌我识别系统中光学仪器的使用要求。
According to the requirements of the laser detection system, H4 and SiO2 were selected as the material of high and low refractive index. The membrane system was optimized and analyzed by Macleod and TFCalc software. The electron beam vacuum deposition method and ion-assisted deposition technique were adopted. The parameters of the material were adjusted and optimized by orthogonal matrix experiments. The long-wave and short-wave reflection bands To broaden and solve the single-sided film is too thick to control the problem, prepared to meet the requirements of the laser filter. The coated substrate had a transmittance of less than 0.2% at 532, 532, 905, 1064 and 1550 nm wavelengths and an average transmittance of greater than 95% near the wavelength of 808 nm. And has high laser damage threshold at 532nm and 1064nm. It can withstand harsh environmental tests and meet the requirements of the optical instruments used in the laser recognition system.