【摘 要】
：
A new stacking method via variation of substrate temperature in rf magnetron sputter is used to fabricate polycrystalline/polycrystalline Ba0.5Sr0.5 TiO3 thin f
【机 构】
：
Key Laboratory for Superfine Materials of Ministry of Education, School of Materials Science and Eng
论文部分内容阅读
A new stacking method via variation of substrate temperature in rf magnetron sputter is used to fabricate polycrystalline/polycrystalline Ba0.5Sr0.5 TiO3 thin films with higher dielectric constant, higher breakdown strength and lower leakage current densities than those prepared by a conventional deposition method. The improved figure of merit G (ε0εrEb) of the Ba0.5Sr0.5 TiO3 thin films implies that they are a feasible insulation layer for thin film electroluminescent devices.
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