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佳能(美国)公司推出FPA-2500i3型i线步进式光刻机最近,佳能(美国)公司向市场推出FPA-2500i3型i线步进式光刻机。这种光刻机适于64-MbitDRAM的生产,具有0.6数字孔径和20mm~2成象视场。采用CQUEST改进照明技术,其分辨率可达<0.35μm(i线光源)和<0.30μm(深紫外线光源)。这咱i线步进式光刻机,可装配6英寸的高速变换装置,这种变换器可存放掩模原版多达29块。采用标准结构,无论是150mm或200mm硅片均可进行曝
Canon (USA) Introduces FPA-2500i3 i-Line Stepper Lithography Canon (US) recently introduced the FPA-2500i3 i-line stepper. This lithography machine for 64-MbitDRAM production, with 0.6 digital aperture and 20mm ~ 2 imaging field of view. CQUEST improves lighting technology with resolutions of <0.35μm (i-line) and <0.30μm (deep-UV). This i line stepping lithography machine, can be equipped with 6-inch high-speed conversion device, this converter can store up to 29 mask original. Using a standard structure, either 150mm or 200mm silicon can be exposed