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利用分子动力学方法模拟了Be原子在Be基底上的沉积过程.模拟了沉积粒子不同入射动能条件下,沉积薄膜表面形态的差异.在一定能量范围内,增加粒子入射动能可以减小薄膜的表面粗糙度.但是,过高的入射动能,不利于减小薄膜表面粗糙度.通过沉积薄膜中原子配位数以及单个原子势能沿薄膜厚度的分布,分析沉积原子入射动能对于薄膜及表面结构的影响.沉积动能较大时,薄膜的密度较大;单个原子势能沿薄膜厚度分布较为连续;同时薄膜中原子应力沿薄膜厚度分布较为连续.最后,分析了沉积粒子能量转化的过程、粒子初始动能对基底表面附近粒子局部动能增加的影响.
The deposition process of Be atoms on Be substrate is modeled by molecular dynamics method, and the difference of surface morphology of deposited films under different incident kinetic energy of sedimentary particles is simulated. Increasing the incident kinetic energy of particles can reduce the surface of thin film However, the high incident kinetic energy is not conducive to reducing the film surface roughness.Based on the distribution of the atomic coordination number and the potential energy of individual atoms along the film thickness, the influence of incident energy of the deposition atoms on the film and the surface structure is analyzed The larger the kinetic energy of deposition, the higher the density of the film, the more uniform the distribution of the potential energy of individual atoms along the film thickness, and the more continuous the distribution of the atomic stress along the film thickness.Finally, the process of energy conversion of the deposited particles, the initial kinetic energy of the particles Effect of local kinetic energy of particles near the substrate surface.