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利用微观相场模型研究了DO22(Ni3V)相间有序畴界原子层次的结构及其迁移特征。研究表明:界面的迁移性与界面结构有关。界面的迁移过程中,V原子跃迁至最近邻的Ni格点处并与之交换,原子的跃迁行为具有位置选择性。原子跃迁行为的位置选择性使得界面迁移前后界面结构保持不变。界面迁移过程及其特征可以用过渡界面来表征,每一种可迁移界面都按照自有的原子跃迁模式进行迁移,并且在迁移的过程中只形成一种独特的过渡界面,界面迁移过程中的原子跃迁模式是诱导界面迁移的热力学和动力学最优化路径。
The microscopic phase field model was used to study the atomic layer structure and migration characteristics of DO22 (Ni3V) ordered interphase. The research shows that the interface mobility is related to the interface structure. In the process of interface migration, the V atom transitions to and exchanges with the nearest neighbor Ni lattice, and the atom transition behavior is position selective. The location selectivity of atomic transition behavior makes the interface structure unchanged before and after migration. Interface migration process and its characteristics can be characterized by a transitional interface. Each of the migratable interfaces is migrated according to its own atomic transition mode, and only a unique transitional interface is formed during migration. During the process of interface migration Atom transition mode is the thermodynamic and kinetic optimization path that induces interface migration.