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日本原子能技术研究机构的研究人员采用呈周期形成柱形的特有蚀刻技术,制成硅光学晶体.首先在硅基板上排列好铁原子聚合物后,以其为核心制作掩模,然后刻蚀基板,制成平顶峰状的圆柱.该方法的特点是柱的大小和柱之间的间隔均保持一致.具体方法是在50μm的四方形基板上,以270nm的间隔形成约4万个直径40nm、高1μm的硅圆柱.并确认其无论是在空中,还是在水中,只反射波长800nm的光.
Researchers at Japan’s Atomic Energy Research Agency made a silicon optical crystal using a unique etching technique that periodically forms a pillar shape. After the iron atom polymer is first arranged on the silicon substrate, a mask is formed at the core of the silicon atom, and then the substrate is etched , Made of flat-topped cylinder.This method is characterized by the size of the column and the spacing between the columns are consistent.Specific method is a 50μm square substrate with 270nm intervals to form about 40,000 diameter 40nm, High 1μm silicon cylinder and make sure that it reflects only light with a wavelength of 800nm either in the air or in water.