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半导体制造的工艺设备供应商Mattson Technology公司,宣布中国领先的半导体制造厂在其300 mm工厂中选用该公司的AspenⅢStrip系统。该系统已经安装在新的生产线上,用于生产DRAM及逻辑器件的光刻胶凹槽工艺。
Mattson Technology, a supplier of process equipment for semiconductor manufacturing, announced that China’s leading semiconductor foundry has chosen the company’s Aspen III Strip system at its 300 mm facility. The system has been installed in a new production line for the production of DRAM and logic device photoresist groove process.