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采用EB-PVD在DD5镍基高温合金与Ni Cr Al涂层之间沉积Zr O2作为先驱层,并对试样分别进行600℃/4 h,700℃/4 h及900℃/4 h真空扩散处理,研究了扩散温度对α-Al2O3活性扩散阻挡层形成的影响,并且通过900℃/100 h恒温氧化处理对活性扩散阻挡层的高温服役性能进行了评价。结果表明:经过900℃/4 h真空扩散处理后,在Zr O2/Ni Cr Al界面形成一层连续致密的α-Al2O3扩散阻挡层,并且经过900℃/100 h大气恒温氧化后,α-Al2O3活性扩散阻挡层表现出良好的稳定性,以及优异的阻扩散能力。
ZrO2 was deposited as a precursor layer between DD5 Ni-base superalloy and Ni Cr Al coating by EB-PVD, and the samples were vacuum-diffused at 600 ℃ for 4 h, 700 ℃ for 4 h and 900 ℃ for 4 h respectively The influence of diffusion temperature on the formation of α-Al2O3 active diffusion barrier was investigated. The service performance of the active diffusion barrier at high temperature was evaluated by constant temperature oxidation at 900 ℃ for 100 h. The results show that a continuous dense α-Al2O3 diffusion barrier layer is formed on the Zr O2 / Ni Cr Al interface after 900 ℃ / 4 h vacuum diffusion treatment, and after 900 ℃ / 100 h atmospheric oxidation, α-Al2O3 The active diffusion barrier exhibits good stability and excellent resistance to diffusion.