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用真空热蒸发方法在ＩＴＯ导电玻璃上镀制了ＭｏＯ３薄膜，在２５０℃条件下于空气环境中将薄膜进行一小时热处理。用Ｘ射线衍射（ＸＲＤ）方法分析薄膜的微观结构，用扫描电镜（ＳＥＭ）观察薄膜的表面形貌。在二电极恒电流方法中，相应于致色过程测量了薄膜的Ｔ－Ｑ曲线，并得到薄膜在７００ｎｍ，５５０ｎｍ和４００ｎｍ的电致色效率。用三电极方法测量了薄膜的循环伏安特性曲线，同时用分光光度计原位测量了薄膜的透射率变化。用Ｇｒａｎｑｖｉｓｔ提出的八面体结构的能带模型解释了吸收波长随注入电荷量的增加而向短波长方向移动的现象。
MoO3 thin films were deposited on ITO conductive glass by vacuum thermal evaporation method. The films were heat treated in air at 250 ℃ for one hour. The microstructure of the film was analyzed by X-ray diffraction (XRD). The surface morphology of the film was observed by scanning electron microscopy (SEM). In the two-electrode galvanostatic method, the T-Q curves of the films were measured corresponding to the color-inducing processes and the electrochromic efficiencies of the films at 700 nm, 550 nm and 400 nm were obtained. The cyclic voltammetry curves of the films were measured by a three-electrode method. The transmittance of the films was measured by a spectrophotometer in situ. The band model of the octahedral structure proposed by Granqvist explains the shift of the absorption wavelength to the short wavelength as the amount of charge injected increases.