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最近,分子束外延(MBE)技术,在基础理论和应用方面的研究都得到稳步发展。1979年5月8日至9日两日间,由美国电化学协会主持,在波士顿召开了分子束外延国际讨论会。所发表论文如表1所示。其中美国12篇,英国2篇,日本3篇,法国1篇。两天的会议主席分别由L.L.Chang(IBM)和A.Y.Ch(?)(Bell)担任。参加会议代表共150名,其中日本10名。为方便起见,将所发表的论文按基础理论研究和应用研究两类分别进行介绍。
Recently, the molecular beam epitaxy (MBE) technology, the basic theory and application of research have been steadily developed. May 1979, two days from May 8 to 9, chaired by the American Electrochemical Society, held in Boston, an international seminar on molecular beam epitaxy. The published papers are shown in Table 1. Among them, there are 12 in the United States, 2 in the United Kingdom, 3 in Japan and 1 in France. The two-day chairman of the meeting was L.L.Chang (IBM) and A.Y.Ch (?) (Bell) respectively. A total of 150 delegates attended the conference, including 10 from Japan. For convenience, the published papers according to the basic theoretical research and applied research are introduced respectively two categories.