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主要研究电磁场对电弧离子镀沉积AlTiN涂层的影响。通过改变电磁场的电压,研究阴极弧斑在不同电磁场下的运动现象以及AlTiN涂层的微观结构和力学性能。结果表明阴极弧斑的运动受磁场电压的影响。增加磁场电压,弧斑更多的在电弧靶中心区域聚集。AlTiN涂层的大颗粒分布、沉积速率、微观结构和硬度相应地受电磁场电压的影响。文章对相关机理进行了研究。
The main study of electromagnetic field on the arc ion plating deposition of AlTiN coating. By changing the voltage of the electromagnetic field, the movement of the cathode arc spot under different electromagnetic fields and the microstructure and mechanical properties of the AlTiN coating were studied. The results show that the motion of the cathode arc spot is affected by the magnetic field voltage. Increase the magnetic field voltage, arc spot more concentrated in the center area of the arc target. The large particle distribution, deposition rate, microstructure and hardness of AlTiN coatings are correspondingly affected by the electromagnetic field voltage. The article has carried on the research to the related mechanism.