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在高真空室里利用从灯丝发射出来的电子轰击带正（１～２ｋＶ）的基体是一个对衬底除气的常用方法。为了增强清洗作用，给灯丝再加了不同的负偏压（０～１００Ｖ）测量了基体电流，灯丝电流随灯丝偏压的变化曲线。得出灯丝较合适偏压为５０Ｖ，轰击时间为１０ｍｉｎ。
Striking a positive (1-2kV) substrate with electrons emitted from the filament in a high vacuum chamber is a common method of degassing a substrate. In order to enhance the cleaning effect, a different negative bias voltage (0 ~ 100V) is added to the filament to measure the change of the base current and the filament current with the filament bias. Draw the filament more appropriate bias voltage is 50V, bombardment time is 10min.