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随着现代军事空间技术的快速发展,对红外探测器的要求越来越高。同时,对红外光学元件的要求也越来越苛刻。主要研究了硫化锌(Zn S)基底表面减反与保护膜的制备技术,采用介质膜与硬膜复合方法,通过对不同材料的对比分析,最终选取碳化锗(Ge1-xCx)材料作为介质膜与DLC类金刚石保护膜的过渡层。利用电子束与离子源辅助沉积技术制备介质膜;磁控溅射技术制备过渡层碳化锗;化学气相沉积技术制备DLC类金刚石保护膜,解决了介质膜与类金刚石保护膜应力匹配的问题,并通过对多种沉积工艺的整合,得到了一套稳定的工艺制备流程。最终在硫化锌基底上制备出的减反射与保护膜平均透过率达到92%,硬度符合要求。
With the rapid development of modern military space technology, the requirements for infrared detectors are getting higher and higher. At the same time, the requirements for infrared optics are also becoming more demanding. In this paper, the preparation of anti-reflection and protective film on the surface of zinc sulfide (ZnS) substrate has been mainly studied. By using the dielectric film and hard film composite method, by comparing the different materials, the Ge1-xCx material was selected as the dielectric film Transition layer with DLC diamond protective film. The dielectric film is prepared by electron beam and ion source-assisted deposition technology; the transitional layer of germanium carbide is prepared by magnetron sputtering; the DLC diamond-like protective film is prepared by chemical vapor deposition technology to solve the problem of stress matching between the dielectric film and the diamond-like protective film Through a variety of deposition process integration, a stable process of preparation was obtained. The average transmittance of the anti-reflection and protection film prepared on the zinc sulfide substrate reached 92%, and the hardness meets the requirements.