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研究了氧化锌薄膜的制备方法,比较了各种制备方法的特点,衬底的作用和衬底的选取。分析了p型掺杂的方法和实现途径,并进行了理论上的探讨,并对ZnO薄膜在未来电子和光电子领域的应用前景进行了展望。
The preparation method of zinc oxide thin film was studied. The characteristics of various preparation methods, the function of substrate and the selection of substrate were compared. The method of p-type doping and the way to realize it are analyzed, and the theoretical discussion is made. The application prospects of ZnO thin films in future electronic and optoelectronic fields are also prospected.