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利用射频磁控溅射技术,以Ar和O_2气混合气体为溅射气体在载玻片上制备了锐钛相TiO_2薄膜。为了提高TiO_2薄膜的光催化活性,在TiO_2薄膜表面进行了钽修饰。利用X射线衍射(XRD),原子力显微镜(AFM)和UV-VIS-NIR分光光度计等技术对薄膜进行了表征。结果表明:对TiO_2薄膜的表面进行适量的Ta元素修饰可以提高其光催化活性。
Anodic anatase TiO 2 thin films were prepared on glass slides by RF magnetron sputtering with a mixture of Ar and O 2 gas as sputtering gas. In order to improve the photocatalytic activity of TiO 2 films, tantalum modification was performed on the surface of TiO 2 films. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometer. The results show that the proper amount of Ta element can improve the photocatalytic activity of TiO_2 films.