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采用Ti-Al-Zr合金靶和Cr靶,用多弧离子镀技术在WC-8%Co硬质合金基体上沉积(Ti,Al,Zr,Cr)N多元氮化物膜。分析了薄膜的成分、形貌、粗糙度和结构,研究了薄膜的显微硬度、膜/基结合力和抗高温氧化性能。结果表明,获得的多元氮化物膜仍是B1-NaCl型TiN面心立方结构;适当控制偏压条件可以改善薄膜的表面形貌;在不同的偏压条件下,(Al+Zr+Cr)/(Ti+Al+Zr+Cr)的成分比为0.41～0.43,当其比值趋于0.4时,薄膜的显微硬度和膜/基结合力达到最大值3600HV0.01和200N;同时薄膜的抗高温氧化性能提高,最高温度可达700℃左右。
(Ti, Al, Zr, Cr) N multiple nitride films were deposited on WC-8% Co cemented carbide substrates by multi-arc ion plating using a Ti-Al-Zr alloy target and a Cr target. The composition, morphology, roughness and structure of the films were analyzed. The film microhardness, film / substrate bonding strength and high temperature oxidation resistance were studied. The results show that the obtained multi-layer nitride film is still the TiN face-centered cubic structure of B1-NaCl type. The surface morphology of the film can be improved by controlling the bias conditions properly. Under different bias conditions, the (Al + Zr + Cr) (Ti + Al + Zr + Cr) is 0.41-0.43, the microhardness and film / substrate bonding reaches the maximum of 3600HV0.01 and 200N when the ratio reaches 0.4. Meanwhile, the high temperature resistance Oxidation performance increased, the maximum temperature up to about 700 ℃.