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我们在试制3DD101管的过程中,摸索出一种选择发射区磷扩散工艺条件的新方法。只要根据基区硼扩散后实测的方块电阻和结深计算出磷预淀积的通源时间和磷主扩散时间就能得到满意的结果。 工艺文件中往往对扩硼后的方块电阻R_b和扩硼结深只规定一个合格的范围(特别是方(?)电阻)。这个范围是在产品试制时经过若干次试验确定下来的。通常是选取实验效果最好
In the process of experimenting with the 3DD101 tube, we found out a new method to select the phosphor diffusion process conditions in the emitter region. As long as the baseline based on the proliferation of boron measured after the box resistance and junction depth to calculate the phosphorus pre-deposition pass time and the main diffusion of phosphorus can be satisfied with the results. In the process document, only the acceptable range (especially the square (?) Resistance) of the sheet resistance R_b and the boron-extended junction depth after boron expansion is specified. This range is determined by the product trial after several tests. It is usually the best choice of experiment