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为了检测全息光栅掩模槽形,运用严格耦合波理论(RCWT)分析镀铬基片光栅光刻胶掩模反射0级衍射效率光谱曲线与槽形参量的关系。测量了400~700 nm波长范围内60°入射角条件下的镀铬基片全息光栅光刻胶掩模反射0级衍射效率光谱曲线。将实验曲线与不同槽形参数对应理论曲线相减、求标准差进行匹配,标准差最小者为匹配结果,从而找到被测掩模的槽深和占宽比(光栅齿宽占光栅周期的百分比)。结果表明,该方法图形匹配速度快,误差容限大,匹配结果与电镜结果相符。对于要求同时检测矩形或接近矩形槽形的全息光刻胶光栅掩模的槽深和占宽比,该方法完全适用。
In order to detect the groove shape of the holographic grating mask, the relationship between the 0th order diffraction efficiency spectral curve and the groove parameters was analyzed by using Rigorous Coupled Wave Theory (RCWT). The 0th-order diffraction efficiency spectral curve of chrome-plated substrate holographic grating resist was measured under the incident angle of 60 ° in the wavelength range of 400-700 nm. The experimental curve with different groove-shaped parameters corresponding to the theoretical curve subtraction, and standard deviation to match the smallest standard deviation for the matching results, to find the measured mask groove depth and occupancy ratio (grating tooth width of the grating period percentage ). The results show that the method has the advantages of fast pattern matching and large error tolerance, and the match result is consistent with the result of electron microscope. This method is perfectly suitable for groove depths and occupancy ratios of holographic photoresist grating masks that require the simultaneous detection of a rectangular or near rectangular groove.