一、引言 随着薄膜技术的发展和薄膜应用的日趋广泛,对薄膜的质量提出了越来越高的要求。在各类真空镀膜中,基板温度是影响薄膜质量的三大要素之一[1],也是镀膜过程中最难测准和控制的因素之一。多年来,国内外生产的各类镀膜机大都采用热电偶来测定基板温度,但是这种方法极不可 I. INTRODUCTION With the development of thin film technology and the increasingly wide application of thin films, higher and higher requirements are put forward on the quality of thin films. Among various types of vacuum coatings, the substrate temperature is one of the three major factors affecting film quality [1], and one of the most difficult to measure and control in the coating process. Over the years, domestic and foreign production of various types of coating machine thermocouple used to measure the substrate temperature, but this method is extremely unlikely