采用先进的离子束强化沉积法,可在各种材料中所选择的面积上涂上硬铬,该工艺可避免化学镀法所使用的溶液及由它所产生的毒性废料。铬涂层5～10μm,在受镀工件的表面直接被合金化,不需要铜或镍的过渡层。该涂层比传统的电镀铬要硬,因为涂层无氢,十分致密,且耐压。涂层也能重现基体表 The use of advanced ion beam enhanced deposition method, the selected area of ​​a variety of materials coated with hard chromium, the process can be used to avoid the chemical plating solution and the toxic waste generated by it. Chromium coating 5 ~ 10μm, the surface of the plated workpiece is directly alloyed, no need for copper or nickel transition layer. The coating is harder than conventional electrochromic chrome because the coating is hydrogen-free, very dense and pressure resistant. The coating also reproduces the matrix table