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采用一种新型的离子束辅助非平衡反应磁控溅射设备制备了TiN/AlN纳米多层复合膜。采用XRD衍射、TEM、显微硬度计和干涉显微镜对TiN/AlN纳米多层膜的微结构和力学性能进行了表征。结果表明:TiN/AlN多层膜有良好的周期;调制结构影响薄膜的择优取向,薄膜整体表现出硬度增强的效果,硬度随调制周期的变化而变化并在调制周期为7.5nm时达到最大值。
TiN / AlN multilayered composite films were prepared by a novel ion beam assisted unbalanced reactive magnetron sputtering equipment. The microstructure and mechanical properties of TiN / AlN multilayered films were characterized by XRD, TEM, microhardness tester and interference microscope. The results show that the TiN / AlN multilayers have a good cycle. The structure of the TiN / AlN multilayer films has a good effect on the preferred orientation of the films. The hardness of the TiN / AlN multilayer films increases with the modulation period and reaches the maximum at the modulation period of 7.5 nm .