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总结了二硫化钼薄膜的特性及其在力学、光电、润滑和催化性能方面的广泛应用。归纳了目前化学气相沉积(CVD)技术制备二硫化钼薄膜的主要方法,包括钼(或钼化合物)的硫化,钼前驱体与硫前驱体的直接反应和硫化物的热分解。讨论了化学气相沉积制备二硫化钼薄膜工艺中成核剂、基板和前驱体对薄膜生长过程的影响,分析了二硫化钼和其他硫族化合物生成合金,与其它单层二维材料形成异质结构方面的研究现状,并对该领域今后的研究方向进行了展望。
The properties of molybdenum disulfide films and their wide application in mechanics, optoelectronics, lubrication and catalytic properties are summarized. The main methods for preparing molybdenum disulfide films by chemical vapor deposition (CVD) are summarized, including the sulfidation of molybdenum (or molybdenum compound), the direct reaction of molybdenum precursors with sulfur precursors and the thermal decomposition of sulfides. The effects of nucleating agents, substrates and precursors on the growth of films were discussed in the preparation of molybdenum disulfide films by chemical vapor deposition. The formation of alloys of molybdenum disulfide and other chalcogenides was analyzed to be heterogeneous with other monolayer two-dimensional materials Structure of the status quo, and future research directions in this area are prospected.