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通过研究真空蒸镀工艺中预熔→蒸发过渡电流变化率对光控膜物理特性（ 附着力和耐磨性） 的影响，得出过渡电流变化率是影响蒸镀膜层物理特性的关键因素之一，并对其机理作了讨论．实验确定出蒸镀阳光控制膜（Ｎｉ／Ｃｒ） 时过渡电流变化率不得小于３０ Ａ／ｓ．
By studying the influence of the rate of change of premelting → evaporating transition current on the physical properties (adhesion and wear resistance) of the light-control film in the vacuum evaporation process, it is concluded that the rate of change of the transition current is one of the key factors affecting the physical properties of the deposited film , And discussed its mechanism. It was experimentally determined that the rate of change of the transition current during deposition of the sunlight control film (Ni / Cr) should not be less than 30 A / s.