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简要回顾了磁头用薄膜材料的晚近发展。用射频溅射法制备了软磁性纯铁膜并考察了溅射条件和真空退火对铁膜微结构和磁性能的影响。所有铁膜都是（１１０）取向的。随着阳极电压ＶＡ的增大，晶格形变量减小，矫顽力Ｈｃ下降。ＶＡ在３．４～３．８ｋＶ范围内时Ｈｃ≤３１０Ａ／ｍ，饱和磁化强度Ｍｓ约１７２０ｋＡ／ｍ，略高于纯铁的块体值（１７００ｋＡ／ｍ）。退火过程中晶粒长大使软磁性能恶化，高温区因工扩散效应导致Ｍｓ下降。
A brief review of recent developments in thin film materials for magnetic heads. The soft magnetic iron film was prepared by radio frequency sputtering and the effects of sputtering conditions and vacuum annealing on the microstructure and magnetic properties of the iron film were investigated. All iron films are (110) oriented. As the anode voltage VA increases, the lattice deformation decreases and the coercivity Hc decreases. Hc≤310A / m and saturation magnetization Ms of about 1720kA / m for VA in the range of 3.4 ~ 3.8kV, slightly higher than that of pure iron (1700kA / m). During the annealing process, the grain growth deteriorates the soft magnetic properties, and the Ms decreases due to the industrial diffusion effect in the high temperature region.