论文部分内容阅读
日电东芝情报系统,是日本超大规模集成电路研究机构之一。它采用全干法腐蚀1微米工艺试制成功了1K位静态RAM,这一研究结果已在今年8月举行的电子通信学会半导体与晶体管研究会上发表。 随着超大规模集成电路的研制,2微米以下的图形的加工技术已成为必不可少的;而在腐蚀工艺方面,将以往的湿法腐蚀改为干法化也提到议事日程上来了,各种干腐蚀技术也迅速地在器件制造中得以广泛的应用。特别是光刻胶图形的形成方法与横向腐蚀少的腐蚀方法变得很重要。最近,以可以进行各向异性腐蚀的反应性溅射腐蚀为中心的平行极板型腐蚀方法,最为引人注目。
Toshiba Toshiba intelligence system, is Japan's large-scale integrated circuit research institutions. It uses a dry-etching 1 micron process successfully trial produced 1K-bit static RAM, the results of this study has been held in August this year, Institute of Electronics and Semiconductor Semiconductor and Transistor Research Conference. With the development of very large scale integrated circuits, the processing technology of graphics below 2 microns has become indispensable. In terms of the etching process, the previous wet etching has been changed to the dry process and the agenda has also been mentioned Kind of dry etching technology is also rapidly in the device manufacturing can be widely used. In particular, the formation of a resist pattern and the etching method with less horizontal etching become important. Recently, the parallel plate-type etching method focusing on reactive sputter etching that can perform anisotropic etching has been the most noticeable.