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用快速划破技术研究了321不锈钢单晶体在3.5％MgCl_2水溶液中裸体表面上氧化膜的形成过程。裸体表面上首先形成一价金属物吸附层,它使腐蚀电流瞬时降低到接近钝态电流,但吸附层是不稳定的过渡物,很快又转变为氧化物。形成吸附层约为2.5 ms,吸附层转变为氧化膜约为3 ms。形成吸附层的动力学规律为i_1(t)=I°exp(-at),氧化膜生长过程的动力学规律为i_2(t)=J°exp(-bt)。氧化膜生长服从高电场下离子导通规律。
The formation of oxide film on the naked surface of 321 stainless steel single crystal in 3.5% MgCl 2 aqueous solution was studied by rapid breaking technique. First, a monovalent metal adsorbed layer is formed on the surface of the nude, which transiently reduces the corrosion current to a near-passive current, but the adsorbed layer is an unstable transition that quickly turns into oxide. The formation of adsorption layer is about 2.5 ms, the adsorption layer is transformed into an oxide film of about 3 ms. The kinetic law of the formation of adsorption layer is i_1 (t) = I ° exp (-at). The kinetics law of the growth of oxide film is i_2 (t) = J ° exp (-bt). Oxide film growth subject to ion conduction under high electric field.