论文部分内容阅读
本文研究了ＰＥＣＶＤ方法制备Ｓｉ－Ｏ－Ｎ系梯度薄膜材料，并运用计算机控制技术成功地制备了涂层折射率随膜深成正弦波形式连续变化的Ｒｕｇａｔｅ单通带滤波器样品。结果表明，采用ＰＥＣＶＤ方法可以制备性能上乘、结构复杂的梯度薄膜材料，ＰＥＣＶＤ方法在研究、开发高级光学涂层领域有着宽广的应用前景。
In this paper, the PECVD method was used to prepare Si-O-N graded thin film materials. The Rugate single-pass filter with refractive index continuously changing with the depth of the film was successfully prepared by computer control technology. The results show that the PECVD method can be used to prepare gradient film materials with high performance and complex structure. The PECVD method has broad application prospects in the research and development of advanced optical coatings.