论文部分内容阅读
采用磁控溅射方法制备了分别以Ta和Ta Cu作为缓冲层的一系列NiFe FeMn双层膜 .实验发现 ,以Ta为缓冲层的NiFe FeMn双层膜的交换偏置场比以Ta Cu为缓冲层的NiFe FeMn双层膜的交换偏置场大 .测量了这两种双层膜的织构、表面粗糙度和表面成分 .结果表明 ,以Ta Cu为缓冲层时 ,Cu在NiFe层的上表面偏聚是造成NiFe FeMn双层膜交换偏置场降低的重要原因 .
A series of NiFe FeMn bilayers with Ta and Ta Cu as buffer layers were prepared by magnetron sputtering.The experimental results show that the exchange bias ratio of NiFe FeMn bilayers with Ta as buffer layer is higher than that with Ta Cu The exchange bias field of the NiFe FeMn bilayer membrane in the buffer layer is large, and the texture, surface roughness and surface composition of the two bilayers are measured.The results show that when Ta Cu is used as the buffer layer, Aggregation of the upper surface is caused by NiFe FeMn bilayer membrane exchange bias field reduction is an important reason.