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现代半导体器件生产过程中需要一套掩模。传统的方法是用精密的分步重复照相机,先制造一块母掩模。然后,用接触印制方法复制成一般常用的光刻掩模。但是,重复照相机成本高,曝光次数多,图象中心距不完全一致,每次套刻也难于对准。这就影响了器件生产的成品率。假若采用激光全息照相的办法,用同一张全息片一次就完成多重图象。这样,每次套版可以保持图象中心距一致,缩短了制造所需要的时间,具有一定的优越性。
Modern masks require a set of masks for the production of semiconductors. The traditional method is to use a sophisticated step-and-repeat camera to create a master mask first. Then, the contact printing method is used to copy a commonly used photolithographic mask. However, the high cost of duplicate cameras, the number of exposures, the image center distance is not exactly the same, each set of engraving is also difficult to align. This affects the yield of device production. If laser holography is used, multiple images will be completed with the same hologram at a time. In this way, each copy can maintain the same image center distance, shortening the manufacturing time required, with some advantages.