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(二)AES在微细加工技术中的应用 自从朗缪尔关于吸附物质对钨阴极热电子发射影响的研究以后、表面分析在电子工业中就开始占住了重要地位。当时的表面分析主要集中在与阴极表面电子发射有关的现象中。本世纪50年代出现了半导体技术,使得表面分析的重心逐步向着半导体技术方向转移。 随着微电子学的蓬勃发展,固体电子器件日益小型化,纵向尺寸已远小于其横向尺
(B) AES in the micro-processing technology Since Langmuir on adsorbed material on the tungsten cathode hot electron emission study, the surface analysis in the electronics industry began to occupy an important position. The surface analysis at that time was mainly focused on phenomena related to the electron emission at the cathode surface. The 50s of this century, the emergence of semiconductor technology, making the focus of surface analysis gradually shifted toward the direction of semiconductor technology. With the rapid development of microelectronics, solid-state electronic devices are increasingly miniaturized, the vertical dimension is much smaller than its horizontal ruler