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本文主要介绍磁控反应溅射制备大面积 ITO薄膜(掺锡氧化铟透明导电薄膜)的导电原理、成膜过程、工艺参数的选择以及不同工艺参数对产品性能的影响。实验结果表明:选择各种合理的工艺参数能够获得不同产品需要的ITO薄膜。
In this paper, the conductive principle, the process of film formation, the selection of process parameters and the influence of different process parameters on the performance of a large area ITO film (indium tin oxide transparent conductive film) prepared by magnetron reactive sputtering are mainly introduced. The experimental results show that the ITO films required by different products can be obtained by selecting a variety of reasonable process parameters.