论文部分内容阅读
本文介绍一种新型的光学薄膜制备用多离子束电子束系统。该系统既可采用聚焦离子束溅射沉积，也可采用传统的电子束蒸发沉积薄膜，并辅助以低能离子轰击，离子可以是惰性元素也可以是反应气体离子。系统的特征是：任何与真空相容的材料均可用作靶材，制备薄膜。系统采用一台１０ｃｍ直径宽束离子源作为辅助沉积；二台特殊设计的聚焦离子源用于溅射沉积。为了能对绝缘样品或在沉积绝缘薄膜时对离子束进行有效而无污染的中和，系统还配置了一台新型的宽束电子源。文中对装置的特点，各个离子源、电子源的性能及特性进行了较详细的描述。利用该系统已制备了如ＴｉＯｘ、ＺｒＯｘ和多层ＺｒＯ２／ＳｉＯ２等特殊的光学薄膜，并取得了良好的结果
This paper introduces a new type of multi-ion beam electron beam system for preparing optical films. The system can be focused ion beam sputter deposition, conventional electron beam evaporation deposition of thin films and assisted bombardment with low-energy ions, which can be either inert or reactive gas ions. The system’s features are: Any material that is compatible with vacuum can be used as a target to make films. A 10 cm diameter wide beam ion source is used as a secondary deposition; two specially designed focused ion sources are used for sputter deposition. The system is also equipped with a new wide-beam electron source in order to effectively and pollution-free neutralization of the ion beam for insulating samples or deposition of insulating films. In this paper, the characteristics of the device, the characteristics of each ion source and electron source are described in detail. Special optical films such as TiOx, ZrOx and multilayer ZrO2 / SiO2 have been prepared using this system and good results have been obtained