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为了满足高精度光学系统对光学元件纳米级的检测精度要求,提出了一种理论可实现纳米级测量的632.8nm移相菲佐干涉仪的设计方案。通过对检测凹面和凸面的632.8nm移相菲佐干涉仪的基本结构和测量原理的分析,指出影响干涉仪测量精度的几种主要误差:移相误差、几何结构误差、振动误差、探测器误差(非线性误差和量化误差)、光源误差(波长不稳定和强度不稳定)、空气扰动和折射率变化误差。通过对这些误差理论分析和模拟,量化了各误差对测量精度的影响,其中移相误差、几何误差、振动误差和空气折射率误差影响最为显著。根据测量精度要求和仿真结果,得到实现纳米级测量的干涉仪系统参数和环境参数设置要求。
In order to meet the requirements of high-precision optical system for the detection accuracy of nanoscale optical components, a design scheme of 632.8nm phase-shifted Fizo interferometer with theoretical nanometer scale measurement is proposed. By analyzing the basic structure and measurement principle of the 632.8nm phase shifting Fischer interferometer which detects the concave and convex surfaces, several main errors that affect the measuring accuracy of the interferometer are pointed out: phase shift error, geometric structure error, vibration error, detector error (Non-linearity and quantization error), light source error (unstable wavelength and unstable intensity), air disturbance and refractive index change error. Through the theoretical analysis and simulation of these errors, the influence of each error on the measurement accuracy is quantified. The phase error, geometric error, vibration error and air refractive index error are the most significant effects. According to the measurement accuracy requirements and the simulation results, the interferometer system parameters and the environmental parameter setting requirements for realizing the nanometer measurement are obtained.