着重论述了采用真空氧等离子射频反应淀积技术,研制超微粒SnO_2薄膜的工艺。该薄膜的AES能谱分析及其计算结果表明,薄膜中Sn、O原子浓度之比小于但接近于1:2,x—ray衍射实验结果及其计算表明,该薄膜含有氧空位和锡间隙原子,且薄膜中SnO_2晶粒粒径平均值为400A左右。这说明该薄膜的微粒粒径的确在超微粒子范围之内,且具有优良的气敏性能,经实验检测发现该薄膜对氧气具有一定的敏感作用。 Emphatically discusses the process of using vacuum oxygen plasma RF reaction deposition technology to develop ultrafine SnO_2 film. AES analysis of the film and its calculation results show that the ratio of Sn and O atoms in the film is less than but close to 1: 2. The results of X-ray diffraction and calculations show that the film contains oxygen vacancies and tin spacers , And the average grain size of SnO 2 in the film is about 400A. This shows that the particle size of the film is indeed in the ultra-fine particles within the range, and has excellent gas sensitivity, the experimental test found that the film has a certain sensitivity to oxygen.