随着大规模集成电路、功能薄膜器件和超导薄膜等高技术的发展,如何精确计算多层薄膜的厚度已成为当今世界发达国家重点研究的一项高技术。但是。迄今尚未发现国外有此类文献报道。上海计算所副研究员胡幼华在分析国内外大量有关资料后,弄清了影响计算多层薄膜厚度的主要因素是:薄膜的X 射线强度不仅取决于本层膜厚,还与其相连的上下层膜 With the development of high technology such as large scale integrated circuits, functional thin film devices and superconducting thin films, how to accurately calculate the thickness of multi-layer thin films has become a high-tech researched by developed countries in today’s world. but. So far no such reports have been found abroad. Hu Youhua, an associate researcher at Shanghai Computation Institute, analyzed a large number of relevant data at home and abroad and found out that the main factor that affects the calculation of multi-layer film thickness is that the X-ray intensity of the film depends not only on the thickness of the film but also on the upper and lower layers