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铋(Ⅱ)在碱性介质(pH10.60～11.38)中,当有8-羟基喹哪啶和十二烷基苯磺酸钠存在时,在-0.60V(对SCE)处得到一个极为灵敏的二次导数示波极谱电流峰(p),较在纯碱性介质中,铋(Ⅱ)的测定灵敏度提高近100倍。铋(Ⅱ)浓度在0.8ng/ml～0.16μg/ml范围内,峰高(i_p)和浓度成正比,检出限为0.4ng/ml(1.9×10~(-9)mol/L),达迄今测铋同类方法的最高灵敏度。用于高温合金中痕量(10~(-5)％～10~(-4)％)铋的测定,结果满意。试验表明,铋(Ⅱ)与8-羟基喹哪啶形成摩尔比为1:2的络合物,其条件稳定常数(K)为2.1×10~(11)(等摩尔变化法)或2.77×10~(11)(摩尔比法)。
Bismuth (II) is extremely sensitive at -0.60 V (vs. SCE) in the presence of 8-hydroxyquinaldine and sodium dodecylbenzenesulfonate in an alkaline medium (pH 10.60-11.38) The second derivative oscillopolarographic peak current (p), in pure alkaline medium, bismuth (II) determination of sensitivity increased nearly 100 times. The concentration of bismuth (Ⅱ) in the range of 0.8ng / ml ~ 0.16μg / ml, the peak height (i_p) and the concentration was proportional to the detection limit of 0.4ng / ml (1.9 × 10-9 mol / L) So far the highest sensitivity of bismuth similar methods. Used in the determination of trace (10 ~ (-5)% ~ 10 ~ (-4)%) bismuth in high temperature alloys with satisfactory results. The results show that the complex with bismuth (Ⅱ) and 8-hydroxyquinaldine at a molar ratio of 1: 2 has a stability constant (K) of 2.1 × 10-11 (equimolar change) or 2.77 × 10 ~ (11) (molar ratio method).