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由中国电子学会生产技术学会、半导体与集成技术学会联合召开的第二届全国电子束、离子束、光子束及超精细加工学术年会于1982年10月27日至11月1日在常州举行。来自全国各地95个单位的282名代表参加了这次会议。会上共有174篇论文分别在6个专业组上宣读,另有51篇论文进行书面交流。美国橡树岭国家实验室B.R.Applton博士应邀到会作了半导体离子注入及激光退火的专题报告。
The 2nd National Academic Conference on Electron Beams, Ion Beams, Photon Beams and Ultrafine Processing jointly held by the Institute of Production Technology, Semiconductor and Integrated Technology Society of China Institute of Electronics was held in Changzhou from October 27 to November 1, 1982 . The conference was attended by 282 representatives from 95 units across the country. A total of 174 papers were read out in six professional groups, and another 51 papers were written. Dr. Oakley Ridley National Laboratory Dr. R. R.Applton was invited to make a special report on semiconductor ion implantation and laser annealing.