论文部分内容阅读
Ｂ４ Ｃ 涂层提供了低 Ｚ（ 原子序数） 和稳定的耐熔表面。在不锈钢和铜合金基片上直接采用真空等离子喷涂法实现２００ μｍ ～３００ μｍ 厚的 Ｂ４ Ｃ 涂层， 是一种经济、快速且有效的第一壁制造工艺。通过对影响 Ｂ４ Ｃ 涂层质量的诸多工艺参数进行优化， 在温度和气氛可控的条件下实现抗热冲击性能良好的 Ｂ４ Ｃ 涂层。该涂层适于作为核聚变装置第一壁耐等离子冲刷的保护涂层。
B4 C coating provides a low Z (atomic number) and stable refractory surface. Direct vacuum plasma spray coating of B4C from 200 μm to 300 μm on stainless steel and copper alloy substrates is an economical, rapid and effective first-wall fabrication process. By optimizing a number of process parameters that affect the quality of the B4 C coating, a B4 C coating with good thermal shock resistance is achieved under controlled temperature and atmosphere conditions. The coating is suitable as a first wall plasma resistant protective coating for nuclear fusion devices.