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给出了一种边缘粗糙度(LER)三维参数评估的方法。采用原子力显微镜(AFM)测量了刻线单侧边缘形貌,根据AFM的工作机理和测量特点重构边缘表面,采用回归分析方法确定了边缘表面的评价基准面。结合集成电路中光刻工艺的具体需求,提出了能够反映边缘表面形貌特征的三维LER表征参数。结合实例,计算了所提出的部分LER参数,分析了LER标准差参数的测量精度。
A method of evaluating three-dimensional parameters of edge roughness (LER) is given. The morphology of one side edge of scribed line was measured by atomic force microscope (AFM). The edge surface was reconstructed according to the working mechanism and measurement characteristics of AFM. The evaluation reference surface of the edge surface was determined by regression analysis. Combined with the specific needs of lithography in integrated circuits, a three-dimensional LER characterization parameter that reflects the topography of the edge surface is proposed. With the example, some proposed LER parameters are calculated, and the measurement accuracy of LER standard deviation parameters is analyzed.