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基于窄带干涉滤光片的峰值透射率测量可以直接反演出薄膜的消光系数,从而得到了一种简易而又精确的评价薄膜微弱损耗的新方法。阐述了确定弱吸收薄膜消光系数的基本原理,并分析了这种评价方法的基本精度。讨论了离子束溅射TiO2薄膜的制备参量对薄膜消光系数的影响。发现溅射速率和氧分压是影响TiO2薄膜损耗的灵敏因素。在保持其它参量不变的条件下,溅射速率从0.35nm/s下降到0.23nm/s,TiO2薄膜的消光系数从3.9×10-5下降到2.1×10-5;辅助离子源的Ar∶O比从1∶2变化为1∶4,对应的消光系数从5.6×10-5下降到2.3×10-5。此外,随着基板温度的提高,损耗也会有所增加。TiO2薄膜消光系数评价的合理性表明由窄带滤光片的峰值透射率来反演薄膜的消光系数是可行的。
Based on the measurement of the peak transmittance of the narrow-band interference filter, the extinction coefficient of the film can be directly inverted, so that a simple and accurate new method for evaluating the weak loss of the film is obtained. The basic principle of determining the extinction coefficient of weakly absorbing film is expounded, and the basic accuracy of this method is analyzed. The effects of preparation parameters of ion beam sputtered TiO2 film on the extinction coefficient of film are discussed. It was found that the sputtering rate and oxygen partial pressure are the sensitive factors that affect the loss of TiO2 thin films. The sputtering rate decreased from 0.35nm / s to 0.23nm / s while the other parameters were kept constant. The extinction coefficient of TiO2 film decreased from 3.9 × 10-5 to 2.1 × 10-5. The Ar: O ratio changes from 1: 2 to 1: 4, and the corresponding extinction coefficient decreases from 5.6 × 10-5 to 2.3 × 10-5. In addition, as the substrate temperature increases, the loss will increase. The rationality of TiO2 film extinction coefficient evaluation shows that it is feasible to invert the film extinction coefficient by the peak transmittance of narrowband filter.