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概述了Al_2O_3薄膜的组织结构和性能特性;系统叙述了Al_2O_3薄膜的多种制备方法,包括真空蒸发法、直流反应磁控溅射法、射频磁控溅射法、射频反应磁控溅射法、中频反应磁控溅射法、脉冲反应磁控溅射法、离子束辅助沉积法、脉冲激光沉积法、化学气相沉积法和溶胶-凝胶法,并综合比较了各种制备工艺的优缺点;最后阐述了Al_2O_3薄膜在机械涂层、光学领域、微电子领域的应用。
The structure and properties of Al 2 O 3 thin films were summarized. Various preparation methods of Al 2 O 3 thin films were described systematically, including vacuum evaporation, DC reactive magnetron sputtering, RF magnetron sputtering, RF magnetron sputtering, Frequency reactive magnetron sputtering method, pulse reactive magnetron sputtering method, ion beam assisted deposition method, pulsed laser deposition method, chemical vapor deposition method and sol-gel method, and comprehensively compared the advantages and disadvantages of various preparation processes; Finally, the application of Al 2 O 3 thin film in the field of mechanical coating, optics and microelectronics is described.