论文部分内容阅读
采用亚阈值激光能量对光学元件进行激光预处理后,其损伤阈值可以提高两三倍。在激光预处理过程中,不可避免地会使光学元件产生损伤,若产生的损伤不影响光学元件的使用性能,则原则上可以接受。首先介绍了HfO2/SiO2多层高反膜S-on-1损伤阈值测试方法,实验研究了激光预处理过程中光学薄膜元件的损伤过程,分析了预处理过程中薄膜损伤形貌对其光学性能及抗激光损伤阈值的影响。结果表明,对膜系为G/(HL)11H2L/A的HfO2/SiO2多层高反膜进行激光预处理,最外层SiO2层的破坏不影响薄膜整个反射率曲线。相反,由于消除了HfO2层的节瘤缺陷,薄膜的损伤阈值得到大幅度的提高。
Using subthreshold laser energy laser pretreatment of optical components, the damage threshold can be increased two or three times. In the process of laser pretreatment, it is unavoidable that the optical element will be damaged. If the resulting damage does not affect the serviceability of the optical element, it is in principle acceptable. First, the threshold of S-on-1 damage threshold of HfO2 / SiO2 multilayer high-reflective film is introduced. The damage process of optical thin film element during laser pretreatment is studied experimentally. The damage morphology of thin film on pretreatment is analyzed. And anti-laser damage threshold. The results show that laser pretreatment of the HfO2 / SiO2 multilayer antireflective film with G / (HL) 11H2L / A film does not affect the whole reflectivity curve of the film. In contrast, the damage threshold of the film is greatly increased by eliminating the nodular defects of the HfO2 layer.