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本文对钌(Ⅲ)SnCl_2-EV高灵敏显色体系测定钌进行了研究。摩尔吸光系数ε_(640nm)高达1.5×10~5L.mol~(-1)·cm~(-1),钌含量在0.2～1.4和1.4～2.2μg/25ml范围内符合比尔定律.对外来离子的干扰进行了研究,并对纯金属镍中痕量钌的含量进行了测定。
In this paper, ruthenium (ruthenium) has been studied in the highly sensitive system of ruthenium (Ⅲ) SnCl_2-EV. Beer’s law is obeyed for the molar extinction coefficient ε 640nm up to 1.5 × 10-5L · mol -1 · cm -1 and ruthenium content is 0.2-1.4 and 1.4-2.2μg / The interference was studied, and the content of pure ruthenium in nickel was measured.